Conductor-insulator-conductor structure
US6081021A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Jan 15, 1998 |
| Grant date | Jun 27, 2000 |
| Priority date | — |
| Expiry date | Jan 15, 2018 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L2924/0002
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
An integrated circuit device including a conductor-insulator-conductor structure and a method of manufacturing the structure simultaneously while forming a dual damascene via. A first interconnect layer is formed upon a first interlevel dielectric. Openings extend through a second interlevel dielectric to the first interconnect layer. An insulator is deposited in the openings. A trench is then etched into the upper portion of the openings that will become vias while simultaneously removing the insulator from the bottom of the openings that will become vias. A conductor is then deposited in the openings and in the trenches and chemical-mechanical polishing (CMP) is used to pattern the conductor. A third interlevel dielectric is then deposited, openings are formed extending to the conductors, and third interconnect layer conductors are deposited and patterned.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.