Method and apparatus for depositing diamond film
US6082294A · kind A · utility
17Cited by
19References
12Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | May 12, 1997 |
| Grant date | Jul 4, 2000 |
| Priority date | — |
| Expiry date | May 12, 2017 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/32082
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
An apparatus for depositing diamond film is disclosed, which comprises: a chamber; a reaction zone in the chamber; means for feeding diamond forming gases and an electron source gas into the reaction zone; means for applying an electric field across the reaction zone to accelerate free electrons of the electron source gas and dissociate hydrogen in the diamond forming gases to produce atomic hydrogen; and a deposition surface adjacent the reaction zone, whereby diamond film is deposited on the deposition surface from the diamond forming gases, assisted by the atomic hydrogen.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.