Fluorine assisted stripping and residue removal in sapphire downstream plasma asher
US6082374A · kind A · utility
12Cited by
16References
13Claims
0Family size
Inventors
Key dates
| Filing date | Sep 24, 1997 |
| Grant date | Jul 4, 2000 |
| Priority date | — |
| Expiry date | Sep 24, 2017 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/3342
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A method for removing material from a substrate. A plasma is generated in a plasma generating and discharge device including a sapphire plasma tube. At least one fluorine-containing compound is introduced into the plasma. A forming gas is introduced into the plasma. The plasma is directed toward the material to be removed from the substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.