Vertical wafer cleaning and drying system
US6082377A · kind A · utility
Inventor
Key dates
| Filing date | May 21, 1999 |
| Grant date | Jul 4, 2000 |
| Priority date | — |
| Expiry date | May 21, 2019 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S134/902
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
A wafer cleaning and drying apparatus comprises a vertical wafer drive assembly providing two-sided wafer cleaning by symmetrically disposed brushes. Each wafer brush comprises two parallel rotatable shafts within the lumen of a substantially tubular sponge, with an adjustable distance between the two shafts, which is narrowed to facilitate insertion into the sponge and widened to stretch the sponge into a substantially oval cross-sectional shape, thereby improving traction. One or more nonrotating perforated fluid delivery tubes are mounted within the lumen of the sponge in the space between the two shafts. The apparatus further comprises a minimal volume rinse/dry enclosure that conserves water and process chemicals; and a wafer transport assembly configured to transfer multiple wafers simultaneously between multiple process stations.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.