Electrodes for plasma treater systems
US6083355A · kind A · utility
Assignee
Inventor
Key dates
| Filing date | Oct 9, 1997 |
| Grant date | Jul 4, 2000 |
| Priority date | — |
| Expiry date | Oct 9, 2017 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB01J2219/0894
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
Continuous-feed plasma treater systems are designed to treat continuous substrates, such as webs or films, by continuously feeding the substrates through an enclosure having a plasma discharge that alters the substrate's surface properties in some desirable fashion. The plasma discharges are generated by one or more electrode assemblies housed within the enclosure. In general, the plasma treater systems of the present invention have one or more cylinder-sleeve electrode assemblies and/or one or more cylindrical cavity electrode assemblies. A cylinder-sleeve electrode assembly comprises a cylinder electrode and a sleeve electrode positioned with its concave face facing and substantially parallel to the cylinder electrode to form an annular gap between the outer surface of the cylinder electrode and the inner surface of the sleeve electrode. The electrode assembly is adapted to be excited to generate a plasma within the annular gap to form a primary plasma discharge zone for exposure of the plasma to a substrate. A cylindrical cavity electrode assembly comprises (1) a cavity electrode, having a cylindrical bore and a wall slot running parallel to the cylindrical bore and exposing the…
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.