Polyvinyl acetals having imido groups and use thereof in photosensitive compositions

US6087066A · kind A · utility

Assignee

• Kodak Polychrome Graphics Company Ltd. · US

Inventors

• Harald Baumann · Tuttlingen, DE
• Celin Savariar-Hauck · Badenhausen, DE
• Hans-Joachim Timpe · Biberach an der Riß, DE

Key dates

• Filing date: Oct 14, 1999
• Grant date: Jul 11, 2000
• Expiry date: Oct 14, 2019

Classification

• Technology area (CPC Y): Emerging Cross-Sectional Technologies
• CPC primary: Y10S430/127
• WIPO field: Macromolecular chemistry, polymers
• WIPO sector: Chemistry

Abstract

This invention relates to polyvinyl acetals containing the units A, B, C and D, wherein A is present in an amount of 0.5 to 20 wt.-% and is of the formula ##STR1## B is present in an amount of 15 to 35 wt.-% and is of the formula ##STR2## C is present in an amount of 10 to 50 wt.-% and is of the formula ##STR3## wherein R.sup.1 is an alkyl group with up to 4 carbons, which is optionally substituted by an acid group, or a phenyl group, to which an acid group is attached, wherein the phenyl group optionally comprises 1 to 2 further substituents selected from halos, amino, methoxy, ethoxy, methyl and ethyl groups, or is a group X--NR.sup.6 --CO--Y--COOH, wherein X is an aliphatic, aromatic or araliphatic spacer group, R.sup.6 is hydrogen or an aliphatic, aromatic or araliphatic moiety and Y is a saturated or unsaturated chain- or ring-shaped spacer group, and this unit C may be contained several times with various moieties R.sup.1 independent of one another, and D is present in an amount of 25 to 70 wt.-% and is of the formula ##STR4## wherein n is an integer from 1 to 3 and PA0 R.sup.2 and R.sup.3 are a hydrogen or a methyl group, and PA0 R.sup.4 and R.sup.5 independent of one anothe…