Patent · US Expired

Production of water-less lithographic plates

US6087073A · kind A · utility

1Cited by
4References
28Claims
0Family size

Assignee

Inventors

Key dates

Filing dateSep 18, 1997
Grant dateJul 11, 2000
Priority date
Expiry dateSep 18, 2017

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG03F7/2024
  • WIPO fieldOptics
  • WIPO sectorInstruments

Abstract

There is described a method of preparing a water-less lithographic plate by coating a positive working photosensitive composition onto an oleophilic base imagewise exposing the plate and developing it to remove the areas of the photosensitive composition which have been light exposed, coating overall the surface of the plate with a layer of a composition which is ink-releasing or when cured becomes ink releasing, then either as a separate step or as a combined step curing the ink-releasing composition or drying the ink-releasing composition and light exposing overall the plate, then redeveloping the plate to remove the photosensitive composition remaining after the first development and any ink-releasing composition overlying the photosensitive composition.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.