Apparatus and method for minimizing electrostatic discharge damage to semiconductor objects
US6088212A · kind A · utility
0Cited by
3References
2Claims
0Family size
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Key dates
| Filing date | Aug 17, 1998 |
| Grant date | Jul 11, 2000 |
| Priority date | — |
| Expiry date | Aug 17, 2018 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/67294
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
An apparatus and method for minimizing electrostatic discharge damage to semiconductor objects utilizes an ionized air stream to reduce electrostatic and triboelectric potential build up in and surrounding semiconductor storage containers. The ionized air stream is continuously directed to a designated area where stored semiconductor objects are being removed from. Electrostatic and triboelectric potential is greatly reduced, minimizing the threat of electrostatic discharge and damage.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.