Polymers and photoresist compositions
US6090526A · kind A · utility
15Cited by
15References
6Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Sep 13, 1996 |
| Grant date | Jul 18, 2000 |
| Priority date | — |
| Expiry date | Sep 13, 2016 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/0045
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The present invention provides novel polymers and photoresist compositions that contain such polymers as a resin binder component. The polymers of the invention include repeating units that contain an acetalester or ketalester moiety. Preferred photoresists of the invention are chemically-amplified positive-acting compositions that contain a polymer with acetalester or ketalester unit as a resin binder component and that can react to provide solubility differences in the presence of photo-generated acid.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.