Low residue aqueous hard surface cleaning and disinfecting compositions
US6090771A · kind A · utility
60Cited by
9References
10Claims
0Family size
Assignee
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Key dates
| Filing date | Jul 26, 1999 |
| Grant date | Jul 18, 2000 |
| Priority date | — |
| Expiry date | Jul 26, 2019 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC11D2111/42
- WIPO fieldBasic materials chemistry
- WIPO sectorChemistry
Abstract
Aqueous based cleaning compositions simultaneously featuring disinfecting, low residue deposit and good cleaning characteristics are provided. The compositions include one or more quaternary amine compounds as disinfecting active agents, an organic solvent system which includes glycol mono-n-butyl ether or a binary system including a glycol ether with a linear primary alcohol, and either one or more betaines, or one or more amine oxides as a surfactant constituent.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.