Calixarenes for use as dissolution inhibitors in lithographic photoresist compositions
US6093517A · kind A · utility
22Cited by
4References
52Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jul 31, 1998 |
| Grant date | Jul 25, 2000 |
| Priority date | — |
| Expiry date | Jul 31, 2018 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC07C2603/92
- WIPO fieldOrganic fine chemistry
- WIPO sectorChemistry
Abstract
A lithographic photoresist composition is provided containing novel calixarene compounds, particularly calix[4]resorcinarenes that are partially or wholly protected with acid-labile functionalities, as dissolution inhibitors. Also provided is a process for using the composition to generate resist images on a substrate is provided, i.e., in the manufacture of integrated circuits or the like.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.