Control process and device for treating the surface of a solid substrate
US6094606A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Jun 25, 1997 |
| Grant date | Jul 25, 2000 |
| Priority date | — |
| Expiry date | Jun 25, 2017 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S205/918
- WIPO fieldOther special machines
- WIPO sectorMechanical engineering
Abstract
A control device for operation of a system for treating a surface of a solid running substrate by dielectric-barrier electrical discharge in a controlled gaseous atmosphere, comprising (A) a system which includes (i) a treatment device through which a substrate to be treated runs at a speed, (ii) the system is connected to the treatment device for supplying the treatment device with gas, (iii) the system is connected to the device for supplying the treatment device with electrical power in order to produce the electrical discharge and (iv) the system for sucking out the gas (B) a data processing unit designed to receive, as input, a datum regarding the speed at which the substrate is running through the treatment device, the data processing unit being connected, on the output side, to the gas supply system, to the electrical power supply system and to the gas suction system, in order: (a) upon starting the treatment device and when the running speed of the substrate is greater than a predetermined speed, to carry out the following actions: initiate operation of the suction system, initiate operation of the gas supply system, initiate operation of the electrical power supply system,…
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.