Polyether-polyester polyurethane polishing pads and related methods
US6095902A · kind A · utility
54Cited by
6References
6Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Sep 23, 1998 |
| Grant date | Aug 1, 2000 |
| Priority date | — |
| Expiry date | Sep 23, 2018 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB24B37/24
- WIPO fieldMachine tools
- WIPO sectorMechanical engineering
Abstract
The present invention provides a polishing pad fabricated from both polyester and polyether polyurethanes. Methods for manufacturing the pads and methods for use of the pads for polishing are also provided.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.