Patent · US Expired

Photo-curable resin composition

US6096796A · kind A · utility

25Cited by
13References
11Claims
0Family size

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Key dates

Filing dateDec 10, 1997
Grant dateAug 1, 2000
Priority date
Expiry dateDec 10, 2017

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG03F7/029
  • WIPO fieldOptics
  • WIPO sectorInstruments

Abstract

A photo-curable resin composition capable of providing a three-dimensional object having excellent mechanical strength and high dimensional accuracy when used in a photo-fabrication process. The resin composition is also capable of providing a three-dimensional object with excellent stability in shape and properties in a photo-fabrication process. The photo-curable composition includes: PA1 (A) a compound represented by the formula (1) ##STR1## wherein R.sup.1 and R.sup.2 independently represent a hydrogen atom or a methyl group; PA1 (B) a compound having a cyclohexene oxide structure; PA1 (C) a cationic photo-initiator; PA1 (D) an ethylenically unsaturated monomer; PA1 (E) a radical photo-initiator; and PA1 (F) a polyol having three or more hydroxyl groups.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.