Apparatus and method for depositing a substance with temperature control
US6099652A · kind A · utility
7Cited by
43References
15Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | May 27, 1997 |
| Grant date | Aug 8, 2000 |
| Priority date | — |
| Expiry date | May 27, 2017 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C16/52
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
An apparatus for depositing synthetic diamond on a surface of a substrate includes a deposition chamber and a cooling block having a surface in the deposition chamber that is cooled by heat exchange. The substrate is supported from the cooling block so that the bottom surface of the substrate is spaced from the cooling block surface by a gap, and a gas is provided in the deposition chamber and in the gap, the gas comprising at least 30 percent hydrogen gas. A plasma deposition system forms in the chamber a plasma containing hydrogen gas and a hydrocarbon gas for depositing synthetic diamond on the top surface of the substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.