Ultraviolet light block and photocatalytic materials
US6099798A · kind A · utility
20Cited by
19References
19Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Oct 31, 1997 |
| Grant date | Aug 8, 2000 |
| Priority date | — |
| Expiry date | Oct 31, 2017 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/8305
- WIPO fieldPharmaceuticals
- WIPO sectorChemistry
Abstract
Nanoscale UV absorbing particles are described that have high UV absorption cross sections while being effectively transparent to visible light. These particles can be used to shield individuals from harmful ultraviolet radiation. These particles can also be used in industrial processing especially to produce solid state electronic devices by creating edges of photoresist material with a high aspect ratio. The UV absorbing particles can also be used as photocatalysts that become strong oxidizing agents upon exposure to UV light. Laser pyrolysis provides an efficient method for the production of suitable particles.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.