Radiation-sensitive mixture and recording material made thereof for offset printing plates
US6100004A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Mar 11, 1998 |
| Grant date | Aug 8, 2000 |
| Priority date | — |
| Expiry date | Mar 11, 2018 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB41C2210/262
- WIPO fieldTextile and paper machines
- WIPO sectorMechanical engineering
Abstract
A positive-working or negative-working radiation-sensitive mixture includes as an IR absorbing component a carbon black pigment having a primary particle size smaller than 80 nm. The carbon black pigment is predispersed in a polymer containing acidic units having a pK.sub.a of less than 13. The radiation-sensitive component may include an ester of (i) a 1,2-naphthoquinone-2-diazide-4-sulfonic acid or a 1,2-naphthoquinone-2-diazide-5-sulfonic acid and (ii) a compound having at least one phenolic hydroxyl group, such as 3 to 6 phenolic hydroxyl groups. After imagewise radiation exposure, the recording material including the radiation-sensitive mixture can be developed without difficulties in an aqueous alkaline solution without leaving residual coating on the areas that became soluble or that remained soluble upon exposure.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.