Developer for irradiated, radiation-sensitive recording materials

US6100016A · kind A · utility

Assignee

• Agfa-Gevaert NV · BE

Inventors

• Steffen Denzinger · Mainz, DE
• Michael Robert Doerr · Hohenahr, DE
• Klaus-Peter Konrad · Ingelheim am Rhein, DE
• Andreas Elsaesser · Idstein, DE
• Paul E. Eckler · Terre Haute, US

Key dates

• Filing date: Sep 14, 1999
• Grant date: Aug 8, 2000
• Expiry date: Sep 14, 2019

Classification

• Technology area (CPC G): Physics
• CPC primary: G03F7/322
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

The invention relates to a developer for irradiated, radiation-sensitive recording materials, in particular for the production of offset printing plates, which contains water, a compound which is alkaline in aqueous solution and a copolymer which acts as an emulsifier and has units of (I) a hydrophobic vinyl compound which has at least one optionally substituted mono- or bicyclic (C.sub.6 -C.sub.14)aryl radical and (II) a hydrophilic, ethylenically unsaturated carboxylic acid. Some of the carboxyl groups of the copolymer are esterified with reaction products of (A) (C.sub.1 -C.sub.30)alkanols, (C.sub.8 -C.sub.25)alkanoic acids, (C.sub.1 -C.sub.12)-alkylphenols or di(C.sub.1 -C.sub.20)alkylamines with (B) (C.sub.2 -C.sub.4)-alkylene oxides or tetrahydrofuran, the molar ratio (A):(B) being in the range from 1:2 to 1:50. If it is intended to develop recording materials having a negative-working layer, the developer additionally contains a water-miscible organic solvent and a surface-active compound. The developer has a low initial viscosity, which increases only slowly with increasing contamination with layer components. Furthermore it shows only a particularly low tendency to foam.