Methods and apparatus for performing microanalytical techniques using photolithographically fabricated substrates having narrow band optical emission capability
US6100973A · kind A · utility
Assignee
Inventor
Key dates
| Filing date | Apr 13, 1998 |
| Grant date | Aug 8, 2000 |
| Priority date | — |
| Expiry date | Apr 13, 2018 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01S5/041
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A substrate (10) has a surface (10A) containing at least one photolithographically defined feature (12, 14A, 14B) for containing a gas or fluid of interest. The substrate further includes at least one region (10B) containing a selected optical gain medium in combination with scattering particles or sites for generating light having a desired wavelength in response to a pump source, such as a laser (20) or a lamp. The at least one region is optically coupled to the at least one photolithographically defined feature for illuminating a portion of the sample with the light having the desired wavelength. The substrate may be comprised of a glass, a polymer, or a semiconductor. In one embodiment at least one optical waveguide (16) is formed in the substrate for conveying light from the pump source to the region containing the gain medium and scatterers. In further embodiments of this invention the pump source can be integrated into the substrate as a laser diode (18A), as may at least one photodetector (18B) for detecting a presence of light emitted by or transmitted through the sample in response to said light having the desired wavelength. Wavelength encoded features can also provided …
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.