Wafer cleaning device
US6101656A · kind A · utility
3Cited by
6References
28Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Nov 25, 1998 |
| Grant date | Aug 15, 2000 |
| Priority date | — |
| Expiry date | Nov 25, 2018 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB08B1/30
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
A wafer-cleaning device comprises a looped belt forming an enclosed region and a pair of rollers. Each roller occupies one end inside the enclosed region. Furthermore, a supporting structure located inside the enclosed region not only supports the rollers, but also maintains some tension on the belt. Thus, one portion of the belt is flat. The supporting structure is capable of supporting a wafer as well. In addition, a wafer-rotating device can be installed next to the edge of a wafer so that the wafer can rotate in a prescribed direction while the wafer surface is cleaned.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.