Optical recording medium and fabrication method therefor
US6103330A · kind A · utility
32Cited by
4References
4Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | May 12, 1998 |
| Grant date | Aug 15, 2000 |
| Priority date | — |
| Expiry date | May 12, 2018 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/21
- WIPO fieldAudio-visual technology
- WIPO sectorElectrical engineering
Abstract
The invention provides a method of fabricating an optical recording medium comprising a phase change type recording layer containing at least one element selected from In, Ag, Te and Sb. The recording layer is formed by a sputtering technique wherein sputtering is carried out while an inert gas and an oxygen gas are introduced in a vacuum chamber in a sputtering system, so that the number of overwritable cycles can be increased by simple means.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.