Pressure relieving pellicle
US6103427A · kind A · utility
17Cited by
1References
18Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Apr 13, 1993 |
| Grant date | Aug 15, 2000 |
| Priority date | — |
| Expiry date | Apr 13, 2013 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F1/64
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A pattern mask pellicle comprising a peripheral frame, a transparent film extending across the top peripheral surface of the frame, and a peripheral gasket adhered to the bottom peripheral surface of the frame, the frame/gasket assembly including at least one tacky, continuous, tortuous path connecting an opening in the interior wall of the assembly with an opening in the exterior wall of the assembly. At least one pellicle is mounted on a pattern mask substrate to protect the pattern area during imaging in the production of integrated circuits.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.