Process for separating chiral compounds using a unimodal large pore silica as the support
US6106724A · kind A · utility
5Cited by
10References
8Claims
0Family size
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Key dates
| Filing date | Mar 29, 1999 |
| Grant date | Aug 22, 2000 |
| Priority date | — |
| Expiry date | Mar 29, 2019 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB01J20/3204
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
A process for separating one chiral compound from a mixture of chiral compounds is disclosed. The separation process involves using a chiral stationary phase (CSP) which comprises a chiral organic material deposited on an amorphous silica support having a unimodal distribution of pore sizes in the range of about 300 .ANG. to about 25,000 .ANG. and a surface area of less than about 30 m.sup.2 /g.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.