Patent · US Expired

Method and apparatus for fabricating near spherical semiconductor single crystal particulate and the spherical product produced

US6106739A · kind A · utility

19Cited by
14References
7Claims
0Family size

Assignee

Inventors

Key dates

Filing dateDec 28, 1999
Grant dateAug 22, 2000
Priority date
Expiry dateDec 28, 2019

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10T428/2993
  • WIPO fieldSurface technology, coating
  • WIPO sectorChemistry

Abstract

An apparatus and a method for producing single crystal semiconductor particulate in near spherical shape and the particulate product so formed is accomplished by producing uniform, monosized, near spherical droplets; identifying the position of an undercooled droplet in a nucleation zone; and seeding the identified droplet in the nucleation zone to initiate single crystal growth in the droplet.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.