Deposition of silicon oxide coating on glass
US6106892A · kind A · utility
13Cited by
5References
7Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | May 20, 1998 |
| Grant date | Aug 22, 2000 |
| Priority date | — |
| Expiry date | May 20, 2018 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC03C2218/152
- WIPO fieldMaterials, metallurgy
- WIPO sectorChemistry
Abstract
A method of depositing a silicon oxide coating on a hot glass substrate by chemical vapor deposition which comprises contacting the substrate with a silane and a phosphorus or boron ester, for example, triakylphosphite or trialkylborate, preferably triethylphosphite. Preferably, the method is performed during the formation of glass by the float glass production process.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.