Photoresist film and process for producing back plate of plasma display panel
US6106992A · kind A · utility
4Cited by
8References
4Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Nov 12, 1997 |
| Grant date | Aug 22, 2000 |
| Priority date | — |
| Expiry date | Nov 12, 2017 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/113
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A photoresist film which can form an even fluorescent substance layer, in intimate contact with the surface of cells, in a simplified manner, and a back plate of PDP using the film are provided. More specifically, a photoresist film comprising a base film and, provided on the base film, a photosensitive resin composition layer comprising a fluorescent substance, a photosensitive resin, and a volatile organic material, and a process for producing a back plate of PDP using the film are provided.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.