Method of manufacturing a composite material
US6110329A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Dec 18, 1998 |
| Grant date | Aug 29, 2000 |
| Priority date | — |
| Expiry date | Dec 18, 2018 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C14/027
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
In a method of manufacturing a composite material structure consisting of a substrate with a layer of essentially pure sp.sup.2 - and sp.sup.3 -hybridized carbon with a sp.sup.3 -hybridized carbon proportion which increases toward the surface of the carbon layer, the carbon layer is deposited on the substrate by a PVD process using a magnetron sputtering apparatus in a process chamber in which an argon partial pressure of 0.6 to 1.0 pa is maintained and, during the carbon deposition, a bias voltage is maintained which is increased with increasing thickness of the layer from 0 to 300 volts.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.