Patent · US Expired

Photosensitive composition

US6110640A · kind A · utility

17Cited by
6References
3Claims
0Family size

Assignee

Inventors

Key dates

Filing dateNov 13, 1997
Grant dateAug 29, 2000
Priority date
Expiry dateNov 13, 2017

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10S430/111
  • WIPO fieldOptics
  • WIPO sectorInstruments

Abstract

A positive working photosensitive composition comprising a specific fluorine-containing copolymer. The positive working photosensitive composition has not only an ability to form a high contrast image but also an ability to inhibit halation, a satisfactory safe light tolerance and a wide development latitude, without lowering the sensitivity.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.