Fluid pressure detector using a diaphragm
US6116092A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Aug 28, 1997 |
| Grant date | Sep 12, 2000 |
| Priority date | — |
| Expiry date | Aug 28, 2017 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01L19/143
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A good quality passive-state film is formed on a gas-contact face of a diaphragm of a pressure detector using a sensor chip to prevent corrosion on, or water content emission from, or catalytic action at a gas-contact face, thereby improving production quality in a semiconductor manufacturing process and providing high accuracy pressure detection. The passive-state film is formed on the gas-contact face of the diaphragm when the diaphragm is mounted on a diaphragm base. The diaphragm base is then fixedly secured to a sensor base in which a sensor chip is housed and a pressure transmitting medium is sealed in a gap between the sensor base and the diaphragm base.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.