Gas injector for plasma enhanced chemical vapor deposition
US6116185A · kind A · utility
5Cited by
11References
14Claims
0Family size
Inventors
Key dates
| Filing date | May 1, 1996 |
| Grant date | Sep 12, 2000 |
| Priority date | — |
| Expiry date | May 1, 2016 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/3321
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
The use of a gas injector including a dielectric material around the ports has an advantage when used with plasma enhanced chemical vapor deposition in that a plasma torch will not be formed at the gas injector and the gases will not dissociate prematurely. This adds to the quality of the coatings and allows the system to be used at higher amperage and thus improved line speeds. The use of a dielectric plug at the ports allows the ports to be easily serviced and replaced.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.