Polishing composition and rinsing composition
US6117220A · kind A · utility
38Cited by
3References
11Claims
0Family size
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Inventors
Key dates
| Filing date | Nov 16, 1999 |
| Grant date | Sep 12, 2000 |
| Priority date | — |
| Expiry date | Nov 16, 2019 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC09K3/1463
- WIPO fieldBasic materials chemistry
- WIPO sectorChemistry
Abstract
A polishing composition for a memory hard disc, which comprises the following components (a) to (d): PA1 (a) water, PA1 (b) at least one compound selected from the group consisting of a polystyrenesulfonic acid, and its salts, PA1 (c) a compound selected from the group consisting of an inorganic acid and an organic acid, and their salts, other than component (b), and PA1 (d) at least one abrasive selected from the group consisting of aluminum oxide, silicon dioxide, cerium oxide, zirconium oxide, titanium oxide, silicon nitride and manganese dioxide.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.