Method for manufacturing low work function surfaces
US6117344A · kind A · utility
39Cited by
11References
20Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 20, 1998 |
| Grant date | Sep 12, 2000 |
| Priority date | — |
| Expiry date | Mar 20, 2018 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/2065
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
Methods for fabricating nano-structured surfaces having geometries in which the passage of elementary particles through a potential barrier is enhanced are described. The methods use combinations of electron beam lithography, lift-off, and rolling, imprinting or stamping processes.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.