Patent · US Expired

Method and apparatus for stereolithography

US6117385A · kind A · utility

15Cited by
2References
10Claims
0Family size

Assignee

Inventors

Key dates

Filing dateAug 3, 1998
Grant dateSep 12, 2000
Priority date
Expiry dateAug 3, 2018

Classification

  • Technology area (CPC B)Performing Operations; Transporting
  • CPC primaryB29K2995/005
  • WIPO fieldOther special machines
  • WIPO sectorMechanical engineering

Abstract

A method and apparatus for producing ordered parts by stereolithography from non-ordered liquid crystal monomers. Liquid crystal monomers contain stiff, rod-like mesogenic segments which can be aligned by an external force such as shear, electric field or magnetic field, causing an anisotropy in properties. When cured in the aligned stated by photopolymerizing the aligned monomers the anisotropic structure is "locked in" resulting in materials with anisotropic physical and mechanical properties. The rigid structure of the mesogenic segments can result in cured networks with high glass transition temperatures if the spacer groups which connect the mesogenic core with the reactive end groups are kept short. Glass transition temperatures of postcured parts ranged from 75 to 148.degree. C. depending on resin and processing conditions. A mechanical anisotropy on the order of two was measured for aligned samples.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.