Method for detecting defects in dielectric film
US6118280A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Mar 27, 1998 |
| Grant date | Sep 12, 2000 |
| Priority date | — |
| Expiry date | Mar 27, 2018 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N1/2813
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
Disclosed are a method and an apparatus for detecting a defect in a dielectric film. The dielectric film is electrified in an electrolyte solution containing a metal in such a manner the dielectric film is charged negative, thereby the metal is deposited on the dielectric film at a position corresponding to the defect. The detecting method has a first deposition step for forming a first metal deposit on the dielectric film in an annular form surrounding the position corresponding to the defect; and a second deposition step for forming a second metal deposit located on the position corresponding to the defect, on the dielectric film. The detecting apparatus has a vessel for accommodating the electrolyte solution; a first electrode for electrifying the dielectric film and a second electrode; and an electric power source for controlably applying a voltage to electrifying between the first electrode and the second electrode in which a value and a direction of the applied voltage is variable.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.