Priming composition for bonding photoresists on substrates
US6121218A · kind A · utility
Inventor
Key dates
| Filing date | Nov 12, 1997 |
| Grant date | Sep 19, 2000 |
| Priority date | — |
| Expiry date | Nov 12, 2017 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC11D2111/22
- WIPO fieldBasic materials chemistry
- WIPO sectorChemistry
Abstract
A priming concentrate composition is provided that functions both as a cleaning and adhesive promoting composition for cleaning a substrate and for bonding a subsequently applied photoresist to the substrate. The concentrate composition contains, as essential components, (a) an alcohol, (b) an alcohol ether, (c) an organic or poly acid and (d) a urea or thiourea-containing compound or derivative or analogue thereof or other compound of heteroatoms with the balance being water. The priming composition can be applied to a stationary or moving substrate, as a concentrate or further diluted with an aqueous medium, by brushing, spraying or immersing and the like.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.