Method for controlled implantation of elements into the surface or near surface of a substrate
US6121624A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Aug 24, 1998 |
| Grant date | Sep 19, 2000 |
| Priority date | — |
| Expiry date | Aug 24, 2018 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/2652
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A method for introducing a known concentration of at least one species of ions into the surface or near surface of a substrate can be employed as a calibration technique prior to subsequent surface or near surface measurement. The method involves the introduction of a removable layer onto the surface followed by ion implantation which is performed to provide a known concentration of implanted ion at the interface between the removable layer and the surface. Subsequent to removal of the removable layer, the surface can be subjected to determination of elemental concentrations at the surface or near surface levels by techniques such as total reflection x-ray fluorescence or secondary ion mass spectrometry.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.