Plasma gas processing
US6126779A · kind A · utility
7Cited by
4References
26Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Nov 7, 1997 |
| Grant date | Oct 3, 2000 |
| Priority date | — |
| Expiry date | Nov 7, 2017 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05H1/461
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
A plasma enhanced gas reactor including a reaction chamber having a pair of field-enhancing electrodes each of which has an axial passage through it by one of which a reactant gas is admitted to the reaction chamber, and by the other of which reaction products are removed from the reaction chamber.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.