Patent · US Expired

Apparatus for removing harmful components in a semiconductor exhaust gas

US6126906A · kind A · utility

8Cited by
7References
6Claims
0Family size

Assignee

Inventor

Key dates

Filing dateOct 19, 1998
Grant dateOct 3, 2000
Priority date
Expiry dateOct 19, 2018

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY02C20/30
  • WIPO fieldChemical engineering
  • WIPO sectorChemistry

Abstract

An apparatus for removing harmful components in a semiconductor exhaust gas includes: a first water scrubber for washing with water a gas to be processed; a gas decomposer tower disposed downstream of the first water scrubber; a second water scrubber disposed downstream of the gas decomposer tower; and a burner tower disposed downstream of the second water scrubber for burning the processed gas, wherein the gas decomposer tower is capable of thermally decomposing a mixture gas of a saturated or unsaturated hydrocarbon gas and a perfluorocarbon or a perfluoride compound by maintaining the mixture gas at a temperature of 600.degree. C. or more in the absence of separated O.sub.2.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.