Forming an amorphous fluorocarbon layer in electroluminescent devices
US6127004A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Jan 29, 1999 |
| Grant date | Oct 3, 2000 |
| Priority date | — |
| Expiry date | Jan 29, 2019 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10K85/631
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A method of forming an electroluminescent device comprising the steps of providing a substrate having a top surface coating with a material including an anode having indium-tin-oxide; and forming an amorphous conductive layer over the anode by providing a fluorocarbon gas in a radical source cavity and subjecting such fluorocarbon gas to a reduced pressure in a range of 0.1 to 20 MT; applying an RF field across the fluorocarbon gas in the radical source cavity to form a plasma having CF.sub.x radicals; depositing the CF.sub.x radicals onto the anode forming an amorphous CF.sub.x conductive polymer layer on the anode; and forming a plurality of layers over the amorphous CF.sub.x conductive polymer layer with such layers including at least one organic electroluminescent layer and a cathode over the electroluminescent layer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.