Reaction resin mixtures and use thereof

US6127092A · kind A · utility

Assignee

• Siemens Aktiengesellschaft · DE

Inventors

• Lothar Schön · Neunkirchen, DE
• Wolfgang Rogler · Erlangen, DE
• Volker Muhrer · Fürth, DE
• Manfred Fedtke · Merseburg, DE
• Andreas Palinsky · Garbsen, DE

Key dates

• Filing date: Jun 26, 1998
• Grant date: Oct 3, 2000
• Expiry date: Jun 26, 2018

Classification

• Technology area (CPC G): Physics
• CPC primary: G03F7/029
• WIPO field: Other special machines
• WIPO sector: Mechanical engineering

Abstract

Curable reaction resin mixtures which are suitable for stereolithography have the following composition: PA1 a cationically curable monomer and/or oligomer, PA1 an initiator with the following structure: ##STR1## where the following applies: R.sup.1 and R.sup.2 are alkyl or cycloalkyl, or together with the S atom they form a heterocyclic ring, PA1 R.sup.3 is H or alkyl, PA1 R.sup.4, R.sup.5, R.sup.6 and R.sup.7 are H, alkyl or alkoxy, PA1 X.sup.- is a non-nucleophilic anion, PA1 and optionally a filler, pigment and/or additive.