Pattern matching apparatus and method that considers distance and direction
US6128410A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Jun 8, 1998 |
| Grant date | Oct 3, 2000 |
| Priority date | — |
| Expiry date | Jun 8, 2018 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06F18/24147
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
An apparatus and method for matching sets of patterns. The apparatus matches an input pattern with reference patterns by extracting feature points of the input pattern to obtain a feature vector, and compares the feature vector of the input pattern with previously stored feature vectors of the reference patterns. The apparatus selects a reference pattern from a database and calculates the distance and direction between the input pattern and the selected reference pattern, to thereby include the reference pattern whose distance from the input pattern is equal to or less than a first threshold value in a matching comparison target, and determines whether the selected reference pattern and its neighbor reference patterns are included in the matching comparison target in consideration of the direction of the neighbor reference patterns with respect to the reference pattern, located within a circle having the point of the selected reference pattern as its center, if the distance between the input pattern and the selected reference pattern is greater than the first threshold value and the difference between the distance and the first threshold value is equal to or less than a second thre…
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.