Patent · US Expired

Method and apparatus for testing an integrated circuit

US6133054A · kind A · utility

44Cited by
6References
13Claims
0Family size

Assignee

Inventor

Key dates

Filing dateAug 2, 1999
Grant dateOct 17, 2000
Priority date
Expiry dateAug 2, 2019

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG01R31/2856
  • WIPO fieldMeasurement
  • WIPO sectorInstruments

Abstract

A method and an associated article of manufacture in which a conductive layer is formed over an uppermost level of interconnect on a semiconductor substrate. The conductive layer is then patterned to form conductive members. At least one of the conductive members includes a first fuse structure in series with a first bond pad portion. The bond pad portion forms an electrical contact with a corresponding integrated circuit device. A voltage is then applied to the device via the conductive member and the bond pad portion. The fuse structure is adapted to form an open between the conductive member and the bond pad portion if the current in the fuse exceeds a predetermined threshold. After the voltage has been applied and the testing completed, the patterned conductive layer is then removed from the semiconductor device prior to final assembly or packaging.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.