Method of fabricating liquid crystal display with increased aperture ratio
US6133967A · kind A · utility
Assignee
Inventor
Key dates
| Filing date | Mar 31, 1999 |
| Grant date | Oct 17, 2000 |
| Priority date | — |
| Expiry date | Mar 31, 2019 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/24917
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A liquid crystal display includes a thin film transistor and a storage capacitor. The thin film transistor includes an active layer formed over a substrate, source and drain regions formed of a impurity-doped semiconductor layer on both sides of the active layer, a gate electrode, and a gate insulating layer formed between the gate electrode and the active layer. The storage capacitor includes a first storage electrode formed over the substrate, a dielectric layer formed over the first storage electrode, and a second storage electrode formed over the dielectric layer. One of the first and second storage electrodes is connected to one of the source and drain regions, and the gate insulating layer and the dielectric layer are formed in different steps or layers.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.