Method and apparatus for depositing zinc oxide film and method for producing photoelectric converter device
US6136162A · kind A · utility
4Cited by
7References
12Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Feb 17, 1999 |
| Grant date | Oct 24, 2000 |
| Priority date | — |
| Expiry date | Feb 17, 2019 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02P70/50
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A deposition method is adapted to deposit a zinc oxide film that has a high light transmittance, an adequate specific electric resistance and a large thickness at a high deposition rate and at low cost in a process that may last long but is stable. The method for depositing a zinc oxide film on a substrate held in an inert gas atmosphere is conducted by magnetron sputtering so that the maximum magnetic flux density in a direction parallel to the surface of the zinc oxide target is held to be not higher than 350 gauss.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.