Acid etch resistant film-forming compositions and composite coating compositions
US6136443A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | May 8, 1998 |
| Grant date | Oct 24, 2000 |
| Priority date | — |
| Expiry date | May 8, 2018 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/31935
- WIPO fieldMacromolecular chemistry, polymers
- WIPO sectorChemistry
Abstract
A curable film-forming composition which is resistant to acid etching is provided. The curable film-forming composition comprises: PA1 A) a polymer prepared from the following ingredients: PA2 1) an ethylenically unsaturated, beta-hydroxy ester functional monomer; PA2 2) an ethylenically unsaturated, hydroxyalkyl functional monomer; PA2 3) a vinyl aromatic compound; and PA2 4) an alkyl ester of acrylic or methacrylic acid having 1 to 30 carbon atoms in the alkyl group; and PA1 B) an etherified aminoplast crosslinking agent. A multi-component composite coating composition is also provided, comprising a base coat deposited from a pigmented film-forming composition and a transparent top coat applied over the base coat in which the transparent coat, or clear coat, is deposited from the curable film-forming composition described above.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.