Color filter manufacturing method capable of assuring a high alignment accuracy of color filter and alignment mark therefor
US6136481A · kind A · utility
11Cited by
1References
6Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Jan 22, 1999 |
| Grant date | Oct 24, 2000 |
| Priority date | — |
| Expiry date | Jan 22, 2019 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02F1/133354
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A red filter and a red alignment mark are simultaneously formed by performing alignment of a photomask for exposure with a groundwork alignment mark. When forming a blue filter, a blue filter pattern is formed from a blue resist by performing alignment of a photomask with the red alignment mark by using a red alignment light. Intensities of reflection lights concerning the red alignment mark are increased by using the red alignment mark that does not absorb the red alignment light when forming the blue filter, so that a high contrast of the red alignment mark is obtained.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.