Constricted glow discharge plasma source
US6137231A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Sep 10, 1996 |
| Grant date | Oct 24, 2000 |
| Priority date | — |
| Expiry date | Sep 10, 2016 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/32027
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A constricted glow discharge chamber and method are disclosed. The polarity and geometry of the constricted glow discharge plasma source is set so that the contamination and energy of the ions discharged from the source are minimized. The several sources can be mounted in parallel and in series to provide a sustained ultra low source of ions in a plasma with contamination below practical detection limits. The source is suitable for applying films of nitrides such as gallium nitride and oxides such as tungsten oxide and for enriching other substances in material surfaces such as oxygen and water vapor, which are difficult process as plasma in any known devices and methods. The source can also be used to assist the deposition of films such as metal films by providing low-energy ions such as argon ions.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.