Patent · US Expired

Multiple stage wet processing platform and method of use

US6138694A · kind A · utility

14Cited by
9References
30Claims
0Family size

Assignee

Inventors

Key dates

Filing dateMar 5, 1999
Grant dateOct 31, 2000
Priority date
Expiry dateMar 5, 2019

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10S134/902
  • WIPO fieldSemiconductors
  • WIPO sectorElectrical engineering

Abstract

A multiple stage wet processing platform includes a sealable enclosure, at least two processing modules positioned within the enclosure, at least one of them including a housing having an opening and a door moveable into position covering the opening, at least two processing vessels within the housing, and an intra-module robot within the housing and including a wafer support member, the intra-module robot moveable to a first position in which the support is disposed in a first one of the processing vessels and a second position in which the support is disposed in a second one of the processing vessels. An inter-module robot is positioned within the enclosure and is moveable between a first position adjacent to a first one of the modules and a second position adjacent to a second one of the modules.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.