Photoresist compositions
US6139920A · kind A · utility
23Cited by
25References
54Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Dec 21, 1998 |
| Grant date | Oct 31, 2000 |
| Priority date | — |
| Expiry date | Dec 21, 2018 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC08L63/00
- WIPO fieldMacromolecular chemistry, polymers
- WIPO sectorChemistry
Abstract
Disclosed is a composition comprising a blend of (a) a thermally reactive polymer selected from the group consisting of resoles, novolacs, thermally reactive polyarylene ethers, and mixtures thereof; and (b) a photoreactive epoxy resin that is photoreactive in the absence of a photocationic initiator.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.