Photosensitive compositions and pattern formation method
US6140007A · kind A · utility
4Cited by
1References
15Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | May 12, 1999 |
| Grant date | Oct 31, 2000 |
| Priority date | — |
| Expiry date | May 12, 2019 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/0125
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Photosensitive compositions prepared without use of a chromium compound. The compositions exhibit high resolution and satisfactory sensitivity, and do not cause environmental pollution. The photosensitive compositions contain a water-soluble azide compound which serves as a photocrosslinking agent and poly(N-vinylformamide) that is photocrosslinkable in the presence of the water-soluble azide compound.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.